Steven Yalisove

Professor

smy@umich.edu

2014 Gerstacker

T: (734) 764-4346

Bio

Projects

Publications

Facilities

Group


Research Facilities

Ultrafast Laser - Material Interaction Laboratory
Location: B122 Gerstacker Building

State of the art optics delivery, delay lines, spectrometers, pulse characterization, frequency doubling, etc. facilities.  These are coupled with a Newport 4 axis computer controlled stage for studying the fundamental physics of ultrafast ablation and the thermal and mechanical response of the material and the ejected material/plasma.  We are currently using an Andor spectrometer for studying Laser Induced Breakdown Spectroscopy.

UHV Si Molecular Beam Epitaxiy Growth and Analysis System
Location: B122 Gerstacker Building

 

This is a state of the art ultra-high vacuum e-beam evaporation system complete with RHEED, LEED, Auger electron spectroscopy, Mass Spectroscopy.
This facility is located beneath the Center for Ultrafast Optical Sciences and has expanded capabilites including ultrafast pulsed laser deposition and film modification tools.
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This is a state of the art ultra-high vacuum e-beam evaporation system complete with RHEED, LEED, Auger electron spectroscopy, Mass Spectroscopy.
This facility is located beneath the Center for Ultrafast Optical Sciences and has expanded capabilites including ultrafast pulsed laser deposition and film modification tools.





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Sputter Deposition System
Location: 1174 GG Brown

 

A Denton vacuum planar magnetron sputtering system is available for thin film deposition in either a normal incidence or confocal geometry. The system typically operates at a base pressure of 5x10-8 torr. The system includes: three targets, multisample stage, two gas inputs, rotating sample stage, bias control and high temperature stage.
What makes this deposition system unique is that it is coupled to a 18KW rotating anode x-ray source. We use the line source which is aligned to 2° to the surface after passing through a monochrometer, slits and a Be window. Scattered x-rays are collected through a Be slit in the chamber door and measured using an INEL position sensitive wire detector.

A Denton vacuum planar magnetron sputtering system is available for thin film deposition in either a normal incidence or confocal geometry. The system typically operates at a base pressure of 5x10-8 torr. The system includes: three targets, multisample stage, two gas inputs, rotating sample stage, bias control and high temperature stage.
What makes this deposition system unique is that it is coupled to a 18KW rotating anode x-ray source. We use the line source which is aligned to 2° to the surface after passing through a monochrometer, slits and a Be window. Scattered x-rays are collected through a Be slit in the chamber door and measured using an INEL position sensitive wire detector.

 

18KW Rotating Anode X-ray Source, 4-Circle Goniometer, Inel Position Sensitive Detector
Location: 1174 GG Brown

An 18KW rotating anode x-ray source is available for x-ray scattering experiments. This facility is capable of delivering a line source to the Denton Sputtering System as well as to a point source aimed towards a Huber 4-circle goniometer. Scintillation detectors or an Inel position sensitive wire detector may be used to collect scattered photons.

To perform structure analysis during sputter film growth, the anode housing is rotated so that a secondary shutter is aligned to direct the line source at a ~2° incidence angle to a growing film at the center of a con-focal geometry sputter deposition system. The x-ray beam is passed through a Be window as it enters the vacuum chamber. The x-rays scatter from a growing film and exit the chamber through a long and narrow Be window in the opposite side of the chamber. The position sensitive detector collects the entire diffraction pattern in about a second permitting the evolution of the growing film structure to be dynamically measured.