BEGIN:VCALENDAR
PRODID:-//AT Content Types//AT Event//EN
VERSION:1.0
BEGIN:VEVENT
DTSTART:20090424T140000Z
DTEND:20090424T160000Z
DCREATED:20090416T195158Z
UID:ATEvent-3b95f124-9c0d-458d-8fc3-ab39b38c21d2
SEQUENCE:0
LAST-MODIFIED:20090416T195212Z
SUMMARY:Brian Puchala
DESCRIPTION:Modeling Defect Mediated Dopant Diffusion in Silicon
LOCATION:Johnson Rooms B & C\, Lurie Engineering Center
PRIORITY:3
TRANSP:0
END:VEVENT
END:VCALENDAR