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PRODID:-//AT Content Types//AT Event//EN
VERSION:2.0
METHOD:PUBLISH
BEGIN:VEVENT
DTSTAMP:20260610T151504Z
CREATED:20241217T170950Z
UID:ATEvent-c3406fe510b94de5b460eec3138799a3
LAST-MODIFIED:20241218T142042Z
SUMMARY:"Factors that Affect Phase Stability and Performance of Hafnium Oxide for Memory Applications"
DTSTART:20250110T153000Z
DTEND:20250110T162000Z
DESCRIPTION:Jon Ihlefeld
LOCATION:1013 H.H. Dow
CONTACT:University of Virginia
CLASS:PUBLIC
END:VEVENT
END:VCALENDAR