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VERSION:1.0
BEGIN:VEVENT
DTSTART:20250110T153000Z
DTEND:20250110T162000Z
DCREATED:20241217T170950Z
UID:ATEvent-c3406fe510b94de5b460eec3138799a3
SEQUENCE:0
LAST-MODIFIED:20241218T142042Z
SUMMARY:"Factors that Affect Phase Stability and Performance of Hafnium Oxide for Memory Applications"
DESCRIPTION:Jon Ihlefeld
LOCATION:1013 H.H. Dow
PRIORITY:3
TRANSP:0
END:VEVENT
END:VCALENDAR