Hanawalt XMAL

J.D. Hanawalt X-Ray MicroAnalysis Laboratory

The MSE department X-ray characterization facilities are located in 2219 HH Dow. Now known as the J.D. Hanawalt XMAL (X-ray MicroAnalysis Laboratory), the goal is to provide state-of-the-art nanostructural characterization capabilities to members of the University of Michigan materials community.  Instrument sign-up and time recording system similar to that that has been in place at EMAL. In addition to our Rigaku rotating anode system and Bede high resolution diffractometer, we have also added a D8 Discover system with an x-y-z translation stage, video imaging system, and fine-focused optics. The safety and operation of the equipment is overseen by Ying Qi, MSE Department Engineer.

If you are trained on XMAL equipment you can reserve time.


Instrument Rates:

University of Michigan rate: $39.52/hour

Other University rate: $60/hour

External rate: $125/hour


Instrument Overview:


Rigaku SmartLab X-Ray Diffractometer
Rigaku SamrtLab system is multipurpose θ/θ X-Ray Diffractometer with fully automated computer control alignment. It can be used for General powder diffraction, Texture measurements, Stress analysis, thin film diffraction. XRR, Triple axis measurement, in-plane measurement and SAXS.  Also in-situ XRD studies at temperature 25°C~1100°C or -100°C~350°C is possible with Heating/Cooling Stage attachment.
  • 2.2KW Long-Fine Focus X-Ray tube
  • Full automated alignment under computer control
  • Focusing and Parallel beam geometries without reconfiguration
  • D/teX Ultra 250 High Speed Silicon Strip 1D Detector
  • Scintillation Detector
  • In-Plane Diffraction Attachment
  • Ge(220) 2 bounce incident Beam Monochromator 
  • Ge(220) 2 Analyzer
  • Anton Paar DHS1100 Domed hot stage
  • Anton Paar DCS350 Domed Cooling/Heating Stage
  • Battery Cell Attachment
  • SASX Attachment


Bede D1 High Resolution X-Ray Diffractometer

The Bede D1 system is a versatile high resolution X-ray diffractometer for the characterization of advanced materials. The system is most suitable for characterization of thin films, superlattices, and single crystal wafers, although it can also characterize other forms of materials.

A range of parameters can be measured including thickness, composition, relaxation, strain, area uniformity, density, roughness, phase, crystalline texture, crystallinity, pore size and grain size.


  • Standard sealed tube X-ray generator for HRXRD, XRD and XRR configurations
  • 100 XY sample stage for 100mm wafer mapping; ability to hold wafers up to 150mm
  • Si 220 beam conditioners for HRXRD and XRR configurations; dual channel analyser for triple axis HRXRD
  • Bede ENHANCED DYNAMIC RANGE (EDR) detector with wide dynamic range
  • Self-contained X-ray safety enclosure
Bruker D8 Discover with GADDS (General Area Detector Diffraction System).

This system is available in a variety of configurations to fulfill requirement of different applications and samples. It’s flexible with samples size and sample amounts, inhomogeneous or oriented sample of complex shape geometry. With 2-D HighStar detector it needs very short measuring time. Typical applications include microdiffraction, phase ID, stress analysis and X-Y mapping.


  • Siemens Kristalloflex 760 X-Ray Generator
  • Spot focus sealed Cu Kα Radiation X-ray tube with Peak power of 2.2 kW
  • Göbel mirror Monochromator
  • Pinhole Collimator/Monocapillary
  • Motorized X/Y/Z sample stage
  • Laser-Video sample alignment system
  • Two circle goniometer
  • Hi Star Area Detector