Steven Yalisove

Professor

smy@umich.edu

2014 Gerstacker

T: (734) 764-4346

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Sputter Deposition System

Location: 1174 GG Brown

 

A Denton vacuum planar magnetron sputtering system is available for thin film deposition in either a normal incidence or confocal geometry. The system typically operates at a base pressure of 5x10-8 torr. The system includes: three targets, multisample stage, two gas inputs, rotating sample stage, bias control and high temperature stage.
What makes this deposition system unique is that it is coupled to a 18KW rotating anode x-ray source. We use the line source which is aligned to 2° to the surface after passing through a monochrometer, slits and a Be window. Scattered x-rays are collected through a Be slit in the chamber door and measured using an INEL position sensitive wire detector.

A Denton vacuum planar magnetron sputtering system is available for thin film deposition in either a normal incidence or confocal geometry. The system typically operates at a base pressure of 5x10-8 torr. The system includes: three targets, multisample stage, two gas inputs, rotating sample stage, bias control and high temperature stage.
What makes this deposition system unique is that it is coupled to a 18KW rotating anode x-ray source. We use the line source which is aligned to 2° to the surface after passing through a monochrometer, slits and a Be window. Scattered x-rays are collected through a Be slit in the chamber door and measured using an INEL position sensitive wire detector.